Reticle SEM specifications required for lithography simulation [5853-36]
- Author(s):
Kariya, M. Yamanaka, E. Tanaka, S. Ikeda, T. Yamaguchi, S. Itoh, M. ( Toshiba Corp. (Japan) ) Kobayashi, H. Kawashima, T. Narukawa, S. ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 550
- Page(to):
- 555
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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