Blank Cover Image

Comprehensive reticle handling and storage approach for optimized fab yields [5853-35]

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
539
Page(to):
549
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings A comprehensive reticle handling and storage approach for optimized fab yields [5992-147]

Nobe, A., Kawashima, H., Kurikawa, A., kasahara, H., Ohta, F., Okubo, Y.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Advances with the new AIMS fab 193 2nd generation: a system for the 65 nm node including immersion [5853-131]

Zibold, A. M., Poortinga, E., Doornmalen, H. v., Schmid, R., Scherubl, T., Harnisch, W.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Mask protection from a haze during shipping and storage

T. Umeda, H. Kawashima, T. Miho, K. Moriya

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Recipe optimization of fab mask inspection for 180 - 90 nm reticles to save inspection time and improve productivity

E. H. Lu, C. Y. Hsiang, J. Wang, J. Zhu, E. Chen, K. Bhattacharyya

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Reticle SEM specifications required for lithography simulation [5853-36]

Kariya, M., Yamanaka, E., Tanaka, S., Ikeda, T., Yamaguchi, S., Itoh, M., Kobayashi, H., Kawashima, T., Narukawa, S.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Automated reticle inspection data analysis for wafer fabs

D. Summers, G. Chen, B. Reese, T. Hutchinson, M. Liesching

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Shipping, handling, and storage of reticles

Zhu, S. -B., Martin, R.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Yield management and reticle defects

Ibsen,K.B., Eickhoff,M.D., Ma,Z.M., Shaw,S.Y., Carlson,S.D., Tomomatsu,H.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Automating defect disposition in fabs and maskshops

P. Fiekowsky, S. Narukawa, T. Kawashima

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Local IP evaluations of EPL reticle with 4 mm-sq Si membranes [5853-118]

Koike, K., Sakaue, H., Arimoto, H., Yamazaki, T., Sugimura, H., Susa, T., Itoh, K., Tamura, A.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L., Liao, C.-H., Dai, Y.-M., Lin, J.-C., Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings True reticle cost saving by multi level reticle approach

T. Struck, H. Kirbach

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12