Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]
- Author(s):
- Edinger, K.
- Boegli, V. ( NaWoTec GmbH (Germany) )
- Degel, W. ( Carl Zeiss SMS GmbH (Germany) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 361
- Page(to):
- 370
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Recent apploaction resulta from the novel e-beam based mask repair system MeRiT MG [6281-28]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Advanced process capabilities for electron beam based photomask repair in a production environment
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Mask repair using layout-based pattern copy for the 65-nm node and beyond [6349-52]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Demonstration of damage-free mask repair using electron beam-induced processes
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Image performance and mask characterization of 157-nm alternating phase-shifting mask
SPIE-The International Society for Optical Engineering |