Implementation of an efficient defect classification methodology for advanced reticle inspection [5853-126]

Implementation of an efficient defect classification methodology for advanced reticle inspection [5853-126]

Author(s):

Yu, P. ( KLA-Tencor Corp. (USA) )

V. Hsu,

Chen, E. ( KLA-Tencor Corp. (Taiwan) )

Lai, R. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Son, K.

Ma, W. ( KLA-Tencor Corp. (USA) )

Chang, P.

Chen, J. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

3 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5853

Pub. Year:

2005

Pt.:

1

Page(from):

345

Page(to):

352

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

Language:

English

Call no.:

P63600/5853

Type:

Conference Proceedings

Details

TDL ID:	ZA00016424
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2005 : 12th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2005.04.13-2005.04.15

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