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Photomask process development for next generation lithography [5853-117]

Author(s):
Sasaki, S.
Itoh, K.
Fujii, A.
Toyama, N.
Mohri, H.
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
1
Page(from):
277
Page(to):
288
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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