Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114]
- Author(s):
- Hsu, S.
- Van Den Broeke, D.
- Chen, J. F.
- Park, J.
- Hsu, M. C. W. ( ASML MaskTools (USA) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 252
- Page(to):
- 264
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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