Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]
- Author(s):
Couderc, C. Belledent, J. Borjon, A. ( Philips Semiconductors (France) ) Trouiller, Y. ( CEA-LETI (France) ) Sundermann, F. ( STMicroelectronics (France) ) Lucas, K. ( Freescale Semiconductors (France) ) Urbani, J.C. Foussadier, F. ( STMicroelectronics (France) ) Rody, Y. ( Philips Semiconductors (France) ) Patterson, K. ( Freescale Semiconductors (France) ) Baron, S. ( STMicroelectronics (France) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 141
- Page(to):
- 151
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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