Requirements for mask technology from the view point of SOC and FLASH memory trends (Invited Paper) [5853-01]

Requirements for mask technology from the view point of SOC and FLASH memory trends (Invited Paper) [5853-01]

Author(s):

Imai, A.

Suko, K. ( Renesas Technology Corp. (Japan) )

1 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5853

Pub. Year:

2005

Pt.:

1

Page(from):

1

Page(to):

9

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

Language:

English

Call no.:

P63600/5853

Type:

Conference Proceedings

Details

TDL ID:	ZA00016424
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2005 : 12th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2005.04.13-2005.04.15

Similar Items:

1 Conference Proceedings A novel Alt-PSM structure: isnt this an embedded Atten-PSM? [6349-100] Nakao, S., Hosono, K., Maejima, S., Narimatsu, K., Hanawa, T., Suko, K. SPIE - The International Society of Optical Engineering	7 Conference Proceedings R-mask: a new concept and its application for small-volume production Hayano, K., Hotta, S., Hasegawa, N., Hosono, K., Tanaka, T., Suko, K., Sasaki, S., Mohri, H., Hoga, M., Hayashi, N. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Super diffraction lithography (SDL): fine random line pattern formation by single-exposure with binary mask Nakao, S., Abe, J., Nakae, A., Imai, A., Narimatsu, K., Suko, K. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Recent trends in TAB tape technology Yoshioka, O., Okabe, N., Chiba, T., Suzuki, K. Electrochemical Society
3 Conference Proceedings Semiconductor technology trend and requirements for masks (Invited Paper) Komiya, H. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Requirements for lithography and mask technology from the standpoint of system LSI business(Invited paper) Kawate,K., Takigawa,T., Ishiuchi,H., Goto,M. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Approximate method of mask flatness factor in focus deviation [6283-81] Maejima, S., Shirai, S., Imai, A., Nakao, S., Tange, K., Chiba, A., Hosono, K., Narimatsu, K. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Recent advances in optical access technologies (Invited Paper) [6390-09] Kani, J., Yoshimoto, N., Iwatsuki, K., Imai, T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Studies on immersion defects using mimic immersion experiments [6153-61] Hanawa, T, Suganaga, T, Ishibashi, T, Maejima, S, Narimatsu, K, Suko, K, Terai, M, Kumada, T, Kitano, J SPIE - The International Society of Optical Engineering	11 Conference Proceedings Verification of optical proximity effect in immersion lithography [6154-176] Suganaga T, Maejima S, Hanawa T, Ishibashi T, Nakao S, Shirai S, Narimatsu K, Suko K, Shiraishi K, Ishii Y, Ando, T, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Impact on mask technology from the viewpoint of DRAM trend (Invited Paper) Koyama,K. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Design for manufacturability production management activity report [6283-01] Miyazaki, N., Sato, T., Honma, M., Yoshioka, N, Hosono, K., Onodera, T., Itoh, H., Suzuki, H., Uga, T., Kadota, K., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12