Effects of TI addiction in WO3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering [6358-36]

Effects of TI addiction in WO3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering [6358-36]

Author(s):

Hu, M. ( Tianjin Univ. (China) )

Yong, C. ( Tianjin Univ. (China) and Kim Check Univ. (South Korea) )

Wang, H. ( Tianjin Univ. (China) )

2 more

Publication title:

Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6358

Pub. Year:

2006

Pt.:

1

Page(from):

635810

Page(to):

635810

Pages:

1

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464538 [0819464538]

Language:

English

Call no.:

P63600/6358

Type:

Conference Proceedings

Details

TDL ID:	ZA00016360
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Instrumentation and Control Technology
Conf. info. (Number):	2006 : 6th
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2006.10.13-2006.10.15

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