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The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask [6349-197]

Author(s):
Tzeng, J.
Lee, B.
Lu, J.
Kozuma, M. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )
Chen, N.
Lin, W. K.
Chung, A.
Houng, Y. C.
Wei, C. H. ( United Microelectronics Corp. (Taiwan) )
4 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
634954
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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