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Minimizing yield-loss risks through post-OPC verification [6349-180]

Author(s):
Wang, C.
Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
Zhang, L.
Gao, G.-S. ( Mentor Graphics Corp. (China) )
Brist, T. E.
Donnelly, T.
Shang, S. ( Mentor Graphics Corp. (USA) )
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63494N
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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