More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products [6349-175]
- Author(s):
Sakurai, H. Oppata, Y. Murano, K. Sakai, M. Itoh, M. Watanabe, H. ( Toshiba Corp. (Japan) ) Funakoshi, H. Ooishi, K. Okamoto, Y. Kaneda, M. Kamei, S. ( Tokyo Electron Kyushu Ltd. (Japan) ) Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 63494J
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Study of second-generation Proximity Gap Suction Development System (PGSD-II) for mask fabrication
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Inspection and printability of programmed defects on reticles for 0.200- and 0.175-μm rule devices
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Optical-controlled matrix switch and free-space optical interconnection by photorefractive polymers
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
First photomask developer based on state-of-the-art wafer processing technology
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Noise reduction in photorefractive memory by double mutually pumped phase conjugate mirrors
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Effect of random phase mask on input plane in photorefractive authentic memory with two-wave encryption method
SPIE - The International Society of Optical Engineering |