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Optimization of development process using after develop inspection in mask manufacturing [6349-200]

Author(s):
Kim, H. Y.
Hwang, D. H.
Kim, S. P.
Han, O. ( Hynix Semiconductor Inc. (South Korea) )
Park, K. H.
Kim, N. W.
Kim, D. ( KLA-Tencor (USA) )
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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