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Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]

Author(s):
Tsuji, Y.
Kikuiri, N.
Murakami, S.
Takahara, K.
Isomura, I.
Tamura, Y.
Yamashita, K.
Hirano, R.
Tateno, M.
Matsumura, K.
Takayama, N.
Usuda, K. ( Advanced Mask Inspection Technology, Inc. (Japan) )
7 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493M
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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