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Study of chromeless mask quartz defect detection capability for 80-nm post structure [6349-136]

Author(s):
Lu, J.
Wang, B.
Chen, F. F.
Wang, O.
Chou, J.
Lin, O. ( Toppan Chunghwa Electronics Corp. (Taiwan) )
Cheng, J.
Chen, E. ( KLA-Tencor Corp. (Taiwan) )
Yu, P. ( KLA-Tencor Corp. (USA) )
4 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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