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45-32-nm node photomask technology with water immersion lithography [6349-134]

Author(s):
Adachi, T.
Inazuki, Y.
Sutou, T.
Morikawa, Y.
Toyama, N.
Mohri, H.
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493J
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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