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OPC to account for thick mask effect using simplified boundary layer model [6349-133]

Author(s):
Kim, S.
Kim, Y.-C.
Suh, S.
Lee, S. ( Synopsys, Inc. (USA) )
Cho, H.
Moon, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Cobb, J.
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493I
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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