Multi-layer resist system for 45-nm-node and beyond: Part III [6349-120]

Multi-layer resist system for 45-nm-node and beyond: Part III [6349-120]

Author(s):

Abe, Y.
Morimoto, J.
Yokoyama, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kominato, A.
Ohkubo, Y. ( HOYA Corp. (Japan) )

Publication title:

Photomask Technology 2006

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6349

Pub. Year:

2006

Pt.:

2

Page(from):

634935

Page(to):

634935

Pages:

1

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

Language:

English

Call no.:

P63600/6349

Type:

Conference Proceedings

Details

TDL ID:	ZA00016353
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2006 : 26th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2006.09.19-2006.09.22

Similar Items:

1 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: part I [6349-18] Hashimoto, M., Shiratori, H., Horii, K., Yokoya, Y., Ohkubo, Y., Takamizawa, H., Fujimura, Y., Morimoto, J., Manoshiro, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Combined resist and etch modeling and correction for the 45-nm node [6349-74] Drapeau, M., Beale, D. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121] Fujimura, Y., Morimoto, J., Manoshiro, A., Shimizu, M., Takamizawa, H., Hashimoto, M., Shiratori, H., Horii, K., Yokoya, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique [6349-62] Biswas, A. M., Li, J., Hiserote, J. A., Melvin III, L. S. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Limitations of optical reticle inspection for 45-nm node and beyond [6349-29] Teuber, S., Bzdurek, A., Durr, A. C., Heumann, J., Holfeld, C. SPIE - The International Society of Optical Engineering	9 Conference Proceedings CDU minimization at the 45-nm node and beyond: optical, resist, and process contributions to CD control S. Scheer, M. Carcasi, T. Shibata, T. Otsuka SPIE - The International Society of Optical Engineering
4 Conference Proceedings Post-lithography characterization of ArF resists for 45 nm node Implant layers and beyond A. Pikon, G. Pohlers, S. Derrough, F. Milesi, J. Foucher Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Controlling CD uniformity for 45nm technology node applications [6349-10] Plumhoff, J., Srinivasan, S., Westerman, R., Johnson, D., Constantine, C. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Dimension controlled CNT probe of AFM metrology tool for 45-nm node and beyond S. Sekino, T. Morimoto, T. Kurenuma, M. Hiraoka, H. Tanaka Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond M. Edamura, Y. Kunitomo, T. Morimoto, S. Sekino, T. Kurenuma, Y. Kembo, M. Watanabe, S. Baba, K. Hidaka SPIE - The International Society of Optical Engineering	12 Conference Proceedings Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond Y. Kushida, H. Handa, H. Maruyama, Y. Abe, Y. Fujimura Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12