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Polysilicon gate and polysilicon wire CD/EPE defect detection and classification through process window [6349-198]

Author(s):
Andrews, S.
Volk, W.
Su, B.
Du, H.
Kumar, B.
Pulusuri, R.
Vikram, A.
Li, X.
Chen, S. ( KLA-Tencor Corp. (USA) )
4 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
634932
Page(to):
634932
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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