Non-chemical cleaning technology for sub-90nm design node photomask manufacturing [6349-106]
- Author(s):
Hoyeh, S. Chen, R. Kozuma, M. Kuo, J. Huang, T. Chen, F. F. ( Toppan Chunghwa Electronics Corp. (Taiwan) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 63492U
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Novel cleaning techniques to achieve defect-free photomasks for sub-65-nm nodes [6349-109]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC
SPIE - The International Society of Optical Engineering |