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Haze detection and haze-induced process latitude variation for low-ki 193 nm lithography [6349-105]

Author(s):
Kim, S.-J.
Park, J.-B. ( Hanyang Univ. (South Korea) )
Kim, S.H.
Kang, H.-Y.
Kang, Y.-M.
Park, S.-W.
An, I.
Oh, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63492T
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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