Required mask specification for mass production devices below 65-nm design node [6349-81]
- Author(s):
Nam, D. Choi, S. Doh, J. Noh, Y. Lee, H. Sin, Y. Kim, B. Kang, M. Han, W. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 634928
- Page(to):
- 634928
- Pages:
- 1
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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