Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
- Author(s):
Park, J. Hsu, S. Van Den Broeke, D. Chen, J. F. ( ASML MaskTools (USA) ) Dusa, M. Socha, R. ( ASML Technology Development Ctr. (USA) ) Finders, J. Vleeming, B. van Oosten, A. Nikolsky, P. ( ASML Netherlands B.V. (Netherlands) ) Wiaux, V. Hendrickx, E. Bekaert, J. Vandenberghe, G. ( IMEC vzw (Belgium) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 634922
- Page(to):
- 634922
- Pages:
- 1
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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