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Feasibility study of mask fabrication in double exposure technology [6349-67]

Author(s):
Doh, J. G.
Lee, S. H.
Yoon, J. B.
Lee, D. Y.
Cho, S. Y.
Kim, B. G.
Choi, S. W.
Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
63491U
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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