Feasibility study of mask fabrication in double exposure technology [6349-67]
- Author(s):
Doh, J. G. Lee, S. H. Yoon, J. B. Lee, D. Y. Cho, S. Y. Kim, B. G. Choi, S. W. Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63491U
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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