Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]

Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]

Author(s):

Chalykh, R.
Pundaleva, I.
Kim, S.
Cho, H.-K.
Moon, J.-T. ( Samsung Electronics Co. (South Korea) )

Publication title:

Photomask Technology 2006

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6349

Pub. Year:

2006

Pt.:

1

Page(from):

63491K

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

Language:

English

Call no.:

P63600/6349

Type:

Conference Proceedings

Details

TDL ID:	ZA00016353
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2006 : 26th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2006.09.19-2006.09.22

Similar Items:

1 Conference Proceedings Scatterometry based profile metrology of two-dimensional patterns of EUV masks I. Pundaleva, R. Chalykh, H. Kim, B. Kim, H. Cho SPIE - The International Society of Optical Engineering	7 Conference Proceedings CD and profile metrology of EUV masks using scatterometry based optical digital profilometry [6349-92] Cho, S., Yedur, S., Kwon, M., Tabet, M. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Image analysis of alignment and overlay marks with compound structure R. Chalykh, I. Pundaleva, J. Shin, S. Kim, H. Cho, J. Moon SPIE - The International Society of Optical Engineering	8 Conference Proceedings Improved scatterometry method of critical dimension measurements and its application for control of development process [6152-16] Pundaleva, I., Nam, D., Han, H., Lee, D., Han, W. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49] Kim, S. S., Park, J., Chalykh, R., Kang, J., Lee, S., Woo, S. G., Cho, H. K., Moon, J. T. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity I. Pundaleva, R. Chalykh, M. Lee, H. Kim, B. Kim Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Overlay metrology for dark hard mask process: simulation and experiment study J. Shin, R. Chalykh, H. Kang, S. Kim, S. Lee, H. Cho SPIE - The International Society of Optical Engineering	10 Conference Proceedings Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153] Yedur, S., Vuong, V., Shivaprasad, D., Sarathy, T. P., Tabet, M., Korlahalli, R., Hu, J. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes I. Pundaleva, R. Chalykh, J. Lee, S. Choi, W. Han SPIE - The International Society of Optical Engineering	11 Conference Proceedings Scatterometry-based overlay metrology Huang, H.-T., Raghavendra, G., Sezginer, A., Johnson, K., Stanke, F.E., Zimmerman, M.L., Cheung, C., Miyagi, M., Singh, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Scatterometry based overlay metrology T. Matsumoto, H. Ina, K. Sentoku, S. Oishi Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Simulation and experiments for inspection properties of EUV mask defects [6283-85] Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12