Mask repair using layout-based pattern copy for the 65-nm node and beyond [6349-52]
- Author(s):
- Boegli, V.
- Auth, N. ( NaWoTec GmbH (Germany) )
- Hofmann, U. ( GenlSys GmbH (Germany) )
- Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63491G
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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