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Image degradation due to phase effects in chromeless phase lithography [6349-38]

Author(s):
Bubke, K.
Sczyrba, M.
Park, K. T.
Neubauer, R. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )
Pforr, R.
Reichelt, J.
Ziebold, R. ( Qimonda Dresden GmbH & Co. OHG (Germany) )
2 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
634913
Page(to):
634914
Pages:
2
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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