Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]
- Author(s):
Huckabay, J. Staud, W. Naber, R. ( Cadence Design Systems, Inc. (USA) ) van Oosten, A. ( ASML, Inc. (Netherlands) ) Nikolski, P. Hsu, S. Socha, R. J. Dusa, M. V. Flagello, D. ( ASML, Inc. (USA) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 634910
- Page(to):
- 634911
- Pages:
- 2
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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