Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology [6349-23]
- Author(s):
Poortinga, E. ( Carl Zeiss SMT Inc. (USA) ) Zibold, A. ( Carl Zeiss SMS GmbH (Germany) ) Conley, W. Litt, L. C. ( Freescale Semiconductor, Inc. (USA) ) Kasprowicz, B. Cangemi, M. ( Photronics, Inc. (USA) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63490N
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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