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Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]

Author(s):
Becker, H.
Renno, M.
Hess, G.
Buttgereit, U. ( Schott Lithotec AG (Germany) )
Koepernik, C.
Nedelmann, L.
Irmscher, M. ( IMS Chips (Germany) )
Birkner, R.
Zibold, A.
Scheruebl, T. ( Carl Zeiss SMS GmbH (Germany) )
5 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
63490J
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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