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Application of DoseMapper for 65-nm gate CD control: strategies and results [6349-16]

Author(s):
Jeewakhan, N.
Shamma, N.
Choi, S.-J.
Alvarez, R. ( Cypress Semiconductor (USA) )
Son, D. H.
Nakamura, M.
Pici, V.
Schreiber, J.
Tzeng, W.
Ang, S.
Park, D. ( ASML (USA) )
6 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
63490G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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