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The study of contact hole for 65nm node with KrF [6283-77]

Author(s):
You, -J. T.
Ko, -W. S.
Moon, J.
Ahn, -B. Y.
Nam, -H. B.
Yim, -G. D. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
628336
Page(to):
628336
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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