Blank Cover Image

A methodology to weight OPC modeling data plans [6283-72]

Author(s):
Hung, -Y. C.
Wang, -H. C.
Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
Ma, C. ( KLA-Tencor Inc. (USA) )
Wu, K. ( Anchor Semiconductor Inc. (USA) )
Zhang, G. ( Anchor Semiconductor Inc. (China) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
628331
Page(to):
628331
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Model based SRAF insertion check with OPC verify tools [6283-73]

Hung, -Y. C., Deng, Z., Gao, G., Zhang, l., Liu, Q.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Optimized OPC approach for process window improvement

C.-H. Wang, Q. Liu, L. Zhang

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings A methodology to take LER effect into OPC modeling algorithm [6154-125]

Hung, C. Y., Liu, Q., Deng, Z., Zhang, L.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings An approach of auto-fix post OPC hot spots

C.-H. Wang, Q. Liu, L. Zhang

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Accelerate OPC convergence with new iteration control methodology

C.-H. Wang, Q. Liu, L. Zhang

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Taking image quality factor into the OPC model tuning flow

C. Wang, Q. Liu, L. Zhang

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Methodology for a sub-90nm contact layer OPC with DEM flow demonstration

Hung, C.-Y., Zhang, B., Zhang, J., Xing, G. Q.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Pattern centric OPC flow: a special RET flow with fast turn-around-time

T. Wang, J. Wu, Q. Liu, G. Zhang, B. Wang

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Considering mask pellicle effect for more accurate OPC model at 45nm technology node

C.-H. Wang, Q. Liu, L. Zhang

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification [6283-104]

Kim, -K. C., Choi, -S. J., Nam, -H. B., Yim, D.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Model-based insertion of assist features using pixel inversion method: implementation in 65 nm node [6283-69]

Hung, -Y. C., Liu, Q., Sakajiri, K., Shang, D. S., Granik, Y.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Parametric design method for geospatial data visualization and interactive map modeling

G. Liu, C. Wu, K. Liu, X. Li, Q. Qi

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12