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Reduction of MDP time through the improvement of verification method [6283-57]

Author(s):
Noh, -H. Y.
Jang, -H. S.
Ki, -T. W.
Choi, -H. J.
Choi, -W. S.
Han, -S. W. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
62832N
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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