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The characterization of line-width in mask using spectrophotometry [6283-51]

Author(s):
Bang, -Y. K.
Choi, -H. Y.
Yaon, -J. H.
Jeong, -Y H.
Kim, -H. Y.
Choi, -W. S.
Yaon, -S. H.
Han, -S. W. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
62832H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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