In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]
- Author(s):
Morikawa, Y. Sutou, T. Inazuki, Y. Adachi, T. Yoshida, Y. Kojima, K. Sasaki, S. Mohri, H. Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) Dmitriev, V. Oshemkov, S. Zait, E. Ben-Zvi, G. ( UCLT Ltd. (Israel) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 62831Y
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
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