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Pattern fidelity enhancement with OPC pattern generation on laser lithography [6283-12]

Author(s):
Lee, G.
Chung, -S. Y.
Yang, -T.W.
Cheng, -H. W.
Lin, -J. R.
Wang, S. T.
Cheng, -C. Y.
Chou, -J. W. ( Toppan Photomasks Taiwan, Ltd. (Taiwan) )
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
62831H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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