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RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

Author(s):
Hsu, M.
Chen, F. J.
Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )
En Tszng, S.
Shieh, J. ( ASML TDC Taiwan (Taiwan) )
Hsu, S.
Shi, X. ( ASML MaskTools, Inc. (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
628317
Page(to):
628317
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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