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Novel mask inspection flow for better defect review and analysis [6283-107]

Author(s):
Lim, K.
Park, H. J.
Chung, H. D.
Choi, W. S.
Han, S. W. ( Samsung Electronics Co., Ltd. (South Korea) )
Takizawa, H.
Miyazaki, K. ( Lasertec Corp. (Japan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
62830Z
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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