Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
- Author(s):
Kikuiri, N. Murakami, S. Tsuchiya, H. Tateno, M. Takahara, K. Imai, S. Hirano, R. Isomura, I. Tsuji, Y. Tamura, Y. Matsumura, K. Usuda, K. ( Advanced Mask Inspection Technology Inc. (Japan) ) Otaki, M. ( Toppan Printing Co., Ltd. (Japan) ) Suga, O. Ohira, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62830Y
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
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