Dark field double dipole lithography (DDL) for 45 nm node and beyond [6283-103]
- Author(s):
- Hsu, S. ( ASML MAskTools (USA) )
- Burkhardt, M. ( IBM Research (USA) )
- Park, J.
- Van Den Broeke, D.
- Chen, F. J. ( ASML MAskTools (USA) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62830U
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
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