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Sigma7500: an improved DUV laser pattern generator addressing sub-100 nm photomask accuracy and productivity requirements [6283-03]

Author(s):
Sjoberg, H.
Karlin, T.
Rosling, M.
ostrom, T.
Mahlen, J.
Newman, T. ( Micronic Laser System AB (Sweden) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
628305
Page(to):
628305
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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