Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]
- Author(s):
Lee, -W. S. ( Samsung Electronics (South Korea) ) Leunissen, A. H. L. Van de Kerhove, J. Philipsen, V. Jonckheere, R. ( IMEC (Belgium) ) Lee, -J. S. Woo, -G. S. Cho, -K. H. Moon, -T. J. ( Samsung Electronics (South Korea) ) - Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810U
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
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