Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Author(s):

Cangemi, M. ( Photonics, IMEC (Belgium) )

Philipsen, V.

De Ruyter, R.

Leunissen, L. ( IMEC (Belgium) )

Morgana, N.

Sixt, P. ( Photonics (France) )

Cottle, R.

Kasprowicz, B. ( Photonics (USA) )

3 more

Publication title:

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6281

Pub. Year:

2006

Page(from):

62810T

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463562 [0819463566]

Language:

English

Call no.:

P63600/6281

Type:

Conference Proceedings

Details

TDL ID:	ZA00016288
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference
Conf. info. (Number):	2006 : 22nd
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2006.01.23-2001.01.26

Similar Items:

1 Conference Proceedings AAPSM repair utilizing transparent etch stop layer Taylor, D., Cangemi, M., Lassiter, M., Poortinga, E. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Optical properties and process impacts of high transmission EAPSM [6154-40] Ham, Y. M., Morgana, N., Sixt, P., Cangemin, M., Kasprowicz, B., Progler, C., Martin, P. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108] Philipsen, V., Leunissen, L., De Ruyter, R., Jonckheere, R., Marlin, P., Wakefield, C., Johnson, S., Cangemi, M., … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Implementation of a transparent etch stop layer for an improved alternating PSM Cangemi, M. J., Taylor, D., Lassiter, M. SPIE - The International Society of Optical Engineering
3 Conference Proceedings polarization effects: EAPSM vs. TT EAPSM [6281-12] Morgana, N., Conley, W., Cangemi, M., Kasprowicz, S. B. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53] Konishi, T., Kojima, Y., Okuda, Y., Philipsen, V., Leunissen, A. H. L., Van Look, L. SPIE - The International Society of Optical Engineering
4 Conference Proceedings High transmission mask technology for 45nm node imaging [6154-38] Conley, W., Morgana, N., Kasprowicz, B. S., Cangemi, M., Lassiter, M., Litt, L. C., Cottle, R., Wu, W., Cobb, J., Ham, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Improved phase uniformity control using a new AAPSM etch stop layer technique Lassiter, M., Cangemi, M.J., Taylor, D. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Tunable transmission phase mask options for 65/45nm node gate and contact processing Kasprowicz, B. S., Conley, W., Ham, Y.-M., Cangemi, M. J., Morgana, N., Cottle, R., Progler, C. J., Wu, W., Litt, L. C., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19] Cottle, R., Sixt, P., Lassiter, M., Cangemi, M., Martin, P., Progler, C. SPIE - The International Society of Optical Engineering
6 Conference Proceedings High transmission mask technology for 45nm node imaging [6154-50] Conley, W., Morgana, N., Kasprowicz B S, Cangemi M, Lassiter M, Litt L C, Cangemin M, Cottle R, Wu W, Cobb J, Ham Y M, … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Feasibility study of embedded binary masks [6349-21] Cangemi, M., Philipsen, V., Leunissen, L. H. A., Taylor, D. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12