Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]
- Author(s):
- Janssen, M.
- van Ingen Schenau, K.
- van der Laan, H. ( ASML Netherlands B.V. (Netherlands) )
- Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810F
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Scatterometry based 65nm node CDU analysis and prediction using novel reticle measurement technique
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Progress toward developing high performance immersion compatible materials and processes
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |