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Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]

Author(s):
Gans, F.
Liebe, R.
Heins, Th.
Richter, J. ( Advanced Mask Technology Ctr. (Germany) )
Hasler-Grohne, W.
Frase, G. C.
Bodermann, B.
Czerkas, S.
Dirscherl, K.
Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) )
5 more
Publication title:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6281
Pub. Year:
2006
Page(from):
62810D
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463562 [0819463566]
Language:
English
Call no.:
P63600/6281
Type:
Conference Proceedings

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