An entropy-based approach to wide area surveillance [6235-10]
- Author(s):
- Collins, E. G.
- Meloon, M. M.
- Sullivan, J. K. ( Toyon Research Corp. (USA) )
- Chinn, J. ( AFRL/SNAR (USA) )
- Publication title:
- Signal processing, sensor fusion, and target recognition XV : 17-19 April 2006, Kissimmee, Florida, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6235
- Pub. Year:
- 2006
- Page(from):
- 623509
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819462916 [0819462918]
- Language:
- English
- Call no.:
- P63600/6235
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Evaluating the role of gigabit speed wide-area networks in remote medical treatment
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Wideband interferometric sensing and imaging polarimetry,and its relevance to wide-area military surveillance and environmental monitoring of the terrestrial …
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Mine detection performance in different soil conditions using data from an ultrawideband wide-area surveillance radar
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Automatic clustering based on an information-theoretic approach with application to spectral anomaly detection [6235-45]
SPIE - The International Society of Optical Engineering |
Materials Research Society |
11
Conference Proceedings
Mine field detection algorithm utilizing data from an ultrawideband wide-area surveillance radar
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Development and Characterization of a Self-Cleaning Shallow Trench Etch Process for Robust 0.35 um and below Manufacturing Environments
Electrochemical Society |
SPIE - The International Society of Optical Engineering |