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Advanced exposure and focus control by proximity profile signature matching [6155-16]

Author(s):
  • Zhou, W. ( United Microelectronics Corp. (Singapore) )
  • See, A. ( United Microelectronics Corp. (Singapore) )
  • Yu, J. ( United Microelectronics Corp. (Singapore) )
Publication title:
Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6155
Pub. Year:
2006
Page(from):
61550H
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461988 [0819461989]
Language:
English
Call no.:
P63600/6155
Type:
Conference Proceedings

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