Layout optimization for multilayer overlay targets [6155-14]
- Author(s):
Binns, L. A. ( Accent Optical Technologies Ltd. (Unnited Kingdom) ) Smith, N. P. ( Accent Optical Technologies (Taiwan) ) Ausschnitt, C. P. ( IBM Microelectronics Division (USA) ) Morningstar, J. ( IBM Microelectronics Division (USA) ) Muth, W. ( IBM Microelectronics Division (USA) ) Schneider, J. ( IBM Microelectronics Division (USA) ) Yerdon, R. ( IBM Microelectronics Division (USA) ) - Publication title:
- Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6155
- Pub. Year:
- 2006
- Page(from):
- 61550F
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461988 [0819461989]
- Language:
- English
- Call no.:
- P63600/6155
- Type:
- Conference Proceedings
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